Dry film photoresist from Japan
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Dry film photoresist from Japan determination of the Commission in investigation no. 731-TA-622 (preliminary) under the Tariff Act of 1930, together with the information obtained in the investigation by

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Published by U.S. International Trade Commission in Washington, DC .
Written in English

Subjects:

  • Photoresists,
  • Printed circuits -- Materials,
  • Microelectronics industry -- Japan,
  • Microelectronics industry -- United States

Book details:

Edition Notes

SeriesUSITC publication -- 2555
The Physical Object
FormatMicroform
Pagination1 v. (various pagings)
ID Numbers
Open LibraryOL14989901M

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Dry film photoresist from Japan [microform]: determination of the Commission in investigation no. TA (preliminary) under the Tariff Act of , together with the information obtained in the investigation U.S. International Trade Commission Washington, DC Australian/Harvard Citation. United States International Trade Commission. Dry film photoresist processing technology [Book Review] Article (PDF Available) in IEEE Electrical Insulation Magazine 18(4) August . hence the dry film can only achieve about 1 to This is not as good as other types of thick film photo-resist such as SU8 which has been reported to be as high as Structure and Composition Dry film photo-resist looks quite different than the common liquid photo-resist. From the appearance, it looks like a sandwich. The top layer is a. Since , we began supplying dry film photoresist, Dry Film Division has worked on the development, manufacturing and distribution of dry films for wiring formation of printed circuit boards, including IC packages, rigid substrates and FPC.

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